P9000: User Friendly Photoresist Coater Developer Cluster System

The C&D P9000 Coater Developer Cluster System is designed to process 4” – 8” wafers. The P9000 can be equipped with vapor prime modules, hot plates, and chill plates.

C&D’s P9000 Cluster System is designed for flexibility and high throughput within a small footprint. The P9000 can be configured as a coater, developer, vapor prime, bake, chill or any variation, and can process a wide range of photoresist and photosensitive polymer applications.

The P9000 maximizes floor space by stacking Hot Plates, Chill Plates, Vacuum Bake, and Vapor Prime modules three high. The P9000 is expandable in the field to keep up with business growth and process requirements.

The P9000 was specifically designed with versatility in mind. Its exceptional software complimented with state of the art hardware allows users to program hot plates at various bake temperatures, prime wafers, coat, and develop in parallel process mode.

The P9000 has two cassette indexers that can be programmed independently. Two cassette platforms allow the user flexibility to run 50 wafer lots or two separate 25 wafer lots. The P9000 allows you to add modules without adding to the footprint.

The central atmospheric robot provides reliability as well a dual end effecter for high volume processing and wafer temperature sensitivity.

C&D’s Graphic User Interface (GUI) combined with a Rabbit Microprocessors provides a powerful control system. This control system allows real time monitoring of process parameters as well as data logging, event reporting, and batch reports. The versatility of the C&D control system allows two separate process flows to be run simultaneously. This feature allows you to take full advantage of all process modules thereby increasing wafer throughput.