Spin Coater & Developer
P9000 Cluster System
Chinese Version
The P9000 Cluster System is high-throughput, versatile wafer processing system that can be configured as a coater, developer, vapor primer, baker, chiller, etc. and can process a wide range of photoresist and photosensitive polymer applications. Its sophisticated system software, along with state-of-the-art hardware, allows the user to program hotplates at various bake temperatures, and prime, coat, and develop wafers in parallel. The system is also easily expandable to keep pace with business growth or process requirements.
Key Features
- Ability to process 50mm-200mm substrates without hardware changeover
- Powerful Graphic User Interface
- Ability to run two parallel recipes
- A central atmospheric robot with dual-end effector
- 5’ x 5’ footprint saves floor space
- High-performance motors for improved uniformity and reliability
- CE mark certifies the system’s compliance with EU requirements
C&D’s Graphic User Interface (GUI) combined with a Rabbit Microprocessors provides a powerful control system. This control system allows real time monitoring of process parameters as well as data logging, event reporting, and batch reports. The versatility of the C&D control system allows two separate process flows to be run simultaneously. This feature allows you to take full advantage of all process modules thereby increasing wafer throughput.
The P9000 has two cassette indexers that can be programmed independently. Two cassette platforms allow the user flexibility to run 50 wafer lots or two separate 25 wafer lots. The P9000 allows you to add modules without adding to the footprint.
The central atmospheric robot provides reliability as well a dual end effecter for high volume processing and wafer temperature sensitivity.
The P9000 maximizes floor space by stacking Hot Plates, Chill Plates, Vacuum Bake, and Vapor Prime modules three high. The P9000 is expandable in the field to keep up with business growth and process requirements.